Serveur d'exploration sur l'Indium

Attention, ce site est en cours de développement !
Attention, site généré par des moyens informatiques à partir de corpus bruts.
Les informations ne sont donc pas validées.

High Critical-Current Superconductor-InAs Nanowire-Superconductor Junctions

Identifieur interne : 000513 ( Chine/Analysis ); précédent : 000512; suivant : 000514

High Critical-Current Superconductor-InAs Nanowire-Superconductor Junctions

Auteurs : RBID : Pascal:13-0003059

Descripteurs français

English descriptors

Abstract

We report on the fabrication of InAs nanowires coupled to superconducting leads with high critical current and widely tunable conductance. We implemented a double lift-off nanofabrication method to get very short nanowire devices with Ohmic contacts. We observe very high critical currents of up to 800 nA in a wire with a diameter of 80 nm. The current- voltage characteristics of longer and suspended nanowires display either Coulomb blockade or supercurrent depending on a local gate voltage, combining different regimes of transport in a single device.

Links toward previous steps (curation, corpus...)


Links to Exploration step

Pascal:13-0003059

Le document en format XML

<record>
<TEI>
<teiHeader>
<fileDesc>
<titleStmt>
<title xml:lang="en" level="a">High Critical-Current Superconductor-InAs Nanowire-Superconductor Junctions</title>
<author>
<name sortKey="Abay, Simon" uniqKey="Abay S">Simon Abay</name>
<affiliation wicri:level="1">
<inist:fA14 i1="01">
<s1>Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology</s1>
<s2>412 96 Göteborg</s2>
<s3>SWE</s3>
<sZ>1 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
</inist:fA14>
<country>Suède</country>
<wicri:noRegion>412 96 Göteborg</wicri:noRegion>
</affiliation>
</author>
<author>
<name sortKey="Nilsson, Henrik" uniqKey="Nilsson H">Henrik Nilsson</name>
<affiliation wicri:level="1">
<inist:fA14 i1="02">
<s1>Division of Solid State Physics, Lund University, Box 118</s1>
<s2>221 00 Lund</s2>
<s3>SWE</s3>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
<country>Suède</country>
<wicri:noRegion>221 00 Lund</wicri:noRegion>
</affiliation>
</author>
<author>
<name>FAN WU</name>
<affiliation wicri:level="1">
<inist:fA14 i1="01">
<s1>Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology</s1>
<s2>412 96 Göteborg</s2>
<s3>SWE</s3>
<sZ>1 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
</inist:fA14>
<country>Suède</country>
<wicri:noRegion>412 96 Göteborg</wicri:noRegion>
</affiliation>
</author>
<author>
<name sortKey="Xu, H Q" uniqKey="Xu H">H. Q Xu</name>
<affiliation wicri:level="1">
<inist:fA14 i1="02">
<s1>Division of Solid State Physics, Lund University, Box 118</s1>
<s2>221 00 Lund</s2>
<s3>SWE</s3>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
<country>Suède</country>
<wicri:noRegion>221 00 Lund</wicri:noRegion>
</affiliation>
<affiliation wicri:level="1">
<inist:fA14 i1="03">
<s1>Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University</s1>
<s2>Beijing 100871</s2>
<s3>CHN</s3>
<sZ>4 aut.</sZ>
</inist:fA14>
<country>République populaire de Chine</country>
<placeName>
<settlement type="city">Pékin</settlement>
</placeName>
</affiliation>
</author>
<author>
<name sortKey="Wilson, C M" uniqKey="Wilson C">C. M. Wilson</name>
<affiliation wicri:level="1">
<inist:fA14 i1="01">
<s1>Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology</s1>
<s2>412 96 Göteborg</s2>
<s3>SWE</s3>
<sZ>1 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
</inist:fA14>
<country>Suède</country>
<wicri:noRegion>412 96 Göteborg</wicri:noRegion>
</affiliation>
</author>
<author>
<name sortKey="Delsing, Per" uniqKey="Delsing P">Per Delsing</name>
<affiliation wicri:level="1">
<inist:fA14 i1="01">
<s1>Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology</s1>
<s2>412 96 Göteborg</s2>
<s3>SWE</s3>
<sZ>1 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
</inist:fA14>
<country>Suède</country>
<wicri:noRegion>412 96 Göteborg</wicri:noRegion>
</affiliation>
</author>
</titleStmt>
<publicationStmt>
<idno type="inist">13-0003059</idno>
<date when="2012">2012</date>
<idno type="stanalyst">PASCAL 13-0003059 INIST</idno>
<idno type="RBID">Pascal:13-0003059</idno>
<idno type="wicri:Area/Main/Corpus">001510</idno>
<idno type="wicri:Area/Main/Repository">001B12</idno>
<idno type="wicri:Area/Chine/Extraction">000513</idno>
</publicationStmt>
<seriesStmt>
<idno type="ISSN">1530-6984</idno>
<title level="j" type="abbreviated">Nano lett. : (Print)</title>
<title level="j" type="main">Nano letters : (Print)</title>
</seriesStmt>
</fileDesc>
<profileDesc>
<textClass>
<keywords scheme="KwdEn" xml:lang="en">
<term>Coulomb blockade</term>
<term>Gallium tellurides</term>
<term>Gates</term>
<term>III-V compound</term>
<term>III-V semiconductors</term>
<term>IV characteristic</term>
<term>Indium arsenides</term>
<term>Lift off</term>
<term>Nanofabrication</term>
<term>Nanostructured materials</term>
<term>Nanowire device</term>
<term>Nanowires</term>
<term>Ohmic contacts</term>
<term>Superconducting junctions</term>
<term>Superconductors</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr">
<term>Arséniure d'indium</term>
<term>Semiconducteur III-V</term>
<term>Composé III-V</term>
<term>Nanofil</term>
<term>Nanomatériau</term>
<term>Jonction supraconductrice</term>
<term>Décollement épitaxique</term>
<term>Dispositif nanofil</term>
<term>Contact ohmique</term>
<term>Caractéristique courant tension</term>
<term>Blocage Coulomb</term>
<term>Electrode commande</term>
<term>Supraconducteur</term>
<term>Tellurure de gallium</term>
<term>InAs</term>
<term>7478N</term>
<term>8107V</term>
<term>8107B</term>
<term>8535K</term>
<term>Nanofabrication</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front>
<div type="abstract" xml:lang="en">We report on the fabrication of InAs nanowires coupled to superconducting leads with high critical current and widely tunable conductance. We implemented a double lift-off nanofabrication method to get very short nanowire devices with Ohmic contacts. We observe very high critical currents of up to 800 nA in a wire with a diameter of 80 nm. The current- voltage characteristics of longer and suspended nanowires display either Coulomb blockade or supercurrent depending on a local gate voltage, combining different regimes of transport in a single device.</div>
</front>
</TEI>
<inist>
<standard h6="B">
<pA>
<fA01 i1="01" i2="1">
<s0>1530-6984</s0>
</fA01>
<fA03 i2="1">
<s0>Nano lett. : (Print)</s0>
</fA03>
<fA05>
<s2>12</s2>
</fA05>
<fA06>
<s2>11</s2>
</fA06>
<fA08 i1="01" i2="1" l="ENG">
<s1>High Critical-Current Superconductor-InAs Nanowire-Superconductor Junctions</s1>
</fA08>
<fA11 i1="01" i2="1">
<s1>ABAY (Simon)</s1>
</fA11>
<fA11 i1="02" i2="1">
<s1>NILSSON (Henrik)</s1>
</fA11>
<fA11 i1="03" i2="1">
<s1>FAN WU</s1>
</fA11>
<fA11 i1="04" i2="1">
<s1>XU (H. Q)</s1>
</fA11>
<fA11 i1="05" i2="1">
<s1>WILSON (C. M.)</s1>
</fA11>
<fA11 i1="06" i2="1">
<s1>DELSING (Per)</s1>
</fA11>
<fA14 i1="01">
<s1>Department of Microtechnology and Nanoscience (MC2), Chalmers University of Technology</s1>
<s2>412 96 Göteborg</s2>
<s3>SWE</s3>
<sZ>1 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
</fA14>
<fA14 i1="02">
<s1>Division of Solid State Physics, Lund University, Box 118</s1>
<s2>221 00 Lund</s2>
<s3>SWE</s3>
<sZ>2 aut.</sZ>
<sZ>4 aut.</sZ>
</fA14>
<fA14 i1="03">
<s1>Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University</s1>
<s2>Beijing 100871</s2>
<s3>CHN</s3>
<sZ>4 aut.</sZ>
</fA14>
<fA20>
<s1>5622-5625</s1>
</fA20>
<fA21>
<s1>2012</s1>
</fA21>
<fA23 i1="01">
<s0>ENG</s0>
</fA23>
<fA43 i1="01">
<s1>INIST</s1>
<s2>27369</s2>
<s5>354000502937790300</s5>
</fA43>
<fA44>
<s0>0000</s0>
<s1>© 2013 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45>
<s0>25 ref.</s0>
</fA45>
<fA47 i1="01" i2="1">
<s0>13-0003059</s0>
</fA47>
<fA60>
<s1>P</s1>
</fA60>
<fA61>
<s0>A</s0>
</fA61>
<fA64 i1="01" i2="1">
<s0>Nano letters : (Print)</s0>
</fA64>
<fA66 i1="01">
<s0>USA</s0>
</fA66>
<fC01 i1="01" l="ENG">
<s0>We report on the fabrication of InAs nanowires coupled to superconducting leads with high critical current and widely tunable conductance. We implemented a double lift-off nanofabrication method to get very short nanowire devices with Ohmic contacts. We observe very high critical currents of up to 800 nA in a wire with a diameter of 80 nm. The current- voltage characteristics of longer and suspended nanowires display either Coulomb blockade or supercurrent depending on a local gate voltage, combining different regimes of transport in a single device.</s0>
</fC01>
<fC02 i1="01" i2="3">
<s0>001B70D78N</s0>
</fC02>
<fC02 i1="02" i2="3">
<s0>001B80A07V</s0>
</fC02>
<fC02 i1="03" i2="3">
<s0>001B80A07B</s0>
</fC02>
<fC02 i1="04" i2="X">
<s0>001D03F18</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE">
<s0>Arséniure d'indium</s0>
<s2>NK</s2>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG">
<s0>Indium arsenides</s0>
<s2>NK</s2>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE">
<s0>Semiconducteur III-V</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG">
<s0>III-V semiconductors</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="X" l="FRE">
<s0>Composé III-V</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="ENG">
<s0>III-V compound</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="SPA">
<s0>Compuesto III-V</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE">
<s0>Nanofil</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG">
<s0>Nanowires</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE">
<s0>Nanomatériau</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG">
<s0>Nanostructured materials</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE">
<s0>Jonction supraconductrice</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG">
<s0>Superconducting junctions</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE">
<s0>Décollement épitaxique</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG">
<s0>Lift off</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="SPA">
<s0>Desprendimiento epitáxico</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="X" l="FRE">
<s0>Dispositif nanofil</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="ENG">
<s0>Nanowire device</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="SPA">
<s0>Dispositivo nanohilo</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE">
<s0>Contact ohmique</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG">
<s0>Ohmic contacts</s0>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE">
<s0>Caractéristique courant tension</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG">
<s0>IV characteristic</s0>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE">
<s0>Blocage Coulomb</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG">
<s0>Coulomb blockade</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE">
<s0>Electrode commande</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="3" l="ENG">
<s0>Gates</s0>
<s5>12</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE">
<s0>Supraconducteur</s0>
<s5>15</s5>
</fC03>
<fC03 i1="13" i2="3" l="ENG">
<s0>Superconductors</s0>
<s5>15</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE">
<s0>Tellurure de gallium</s0>
<s2>NK</s2>
<s5>16</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG">
<s0>Gallium tellurides</s0>
<s2>NK</s2>
<s5>16</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE">
<s0>InAs</s0>
<s4>INC</s4>
<s5>46</s5>
</fC03>
<fC03 i1="16" i2="3" l="FRE">
<s0>7478N</s0>
<s4>INC</s4>
<s5>71</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE">
<s0>8107V</s0>
<s4>INC</s4>
<s5>72</s5>
</fC03>
<fC03 i1="18" i2="3" l="FRE">
<s0>8107B</s0>
<s4>INC</s4>
<s5>73</s5>
</fC03>
<fC03 i1="19" i2="3" l="FRE">
<s0>8535K</s0>
<s4>INC</s4>
<s5>74</s5>
</fC03>
<fC03 i1="20" i2="3" l="FRE">
<s0>Nanofabrication</s0>
<s4>CD</s4>
<s5>96</s5>
</fC03>
<fC03 i1="20" i2="3" l="ENG">
<s0>Nanofabrication</s0>
<s4>CD</s4>
<s5>96</s5>
</fC03>
<fC03 i1="20" i2="3" l="SPA">
<s0>Nanofabricación</s0>
<s4>CD</s4>
<s5>96</s5>
</fC03>
<fN21>
<s1>007</s1>
</fN21>
<fN44 i1="01">
<s1>OTO</s1>
</fN44>
<fN82>
<s1>OTO</s1>
</fN82>
</pA>
</standard>
</inist>
</record>

Pour manipuler ce document sous Unix (Dilib)

EXPLOR_STEP=IndiumV3/Data/Chine/Analysis
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000513 | SxmlIndent | more

Ou

HfdSelect -h $EXPLOR_AREA/Data/Chine/Analysis/biblio.hfd -nk 000513 | SxmlIndent | more

Pour mettre un lien sur cette page dans le réseau Wicri

{{Explor lien
   |wiki=   *** parameter Area/wikiCode missing *** 
   |area=    IndiumV3
   |flux=    Chine
   |étape=   Analysis
   |type=    RBID
   |clé=     Pascal:13-0003059
   |texte=   High Critical-Current Superconductor-InAs Nanowire-Superconductor Junctions
}}

Wicri

This area was generated with Dilib version V0.5.77.
Data generation: Mon Jun 9 10:27:54 2014. Site generation: Thu Mar 7 16:19:59 2024